The ultra-high vacuum magnetron sputtering all-in-one system for 8-inch wafers can be used to prepare wafer-level high-quality materials such as metal electrode thin films, magnetic metal thin films, oxide dielectric materials, metal nitride materials, etc. This system could support an ultrahigh vacuum background environment with low oxygen content, few impurities, good crystallinity, and high coating uniformity for the fabrication of high-quality materials. They are widely used in the research and development of superconducting devices, quantum devices, and spintronics.
Specifications
Base pressure: ~10-10 Torr、Multi-chamber interconnection, composite film fabrication、Single substrate for various size、Rotatable substrate up to 850 ℃、Five target guns、Tunable target-substrate distance、Design to prevent cross-contamination、Load lock for sample unloading and loading、Sample pre-cleaning set-up An automatic pressure control
The ultra-high vacuum magnetron sputtering all-in-one system for 8-inch wafers can be used to prepare wafer-level high-quality materials such as metal electrode thin films, magnetic metal thin films, oxide dielectric materials, metal nitride materials, etc. This system could support an ultrahigh vacuum background environment with low oxygen content, few impurities, good crystallinity, and high coating uniformity for the fabrication of high-quality materials. They are widely used in the research and development of superconducting devices, quantum devices, and spintronics.
Specifications
Base pressure: ~10-10 Torr、Multi-chamber interconnection, composite film fabrication、Single substrate for various size、Rotatable substrate up to 850 ℃、Five target guns、Tunable target-substrate distance、Design to prevent cross-contamination、Load lock for sample unloading and loading、Sample pre-cleaning set-up An automatic pressure control
